Vacuum sputtering cathode

Details Vacuum sputtering cathode Vacuum sputtering cathode

H - Electricity

01

J

H01J 37/34 (2006.01)

Patent

CA 2492174

The invention relates to a vacuum sputtering cathode comprising a target support (2) consisting of a cooler. The inventive cathode is characterised in that it comprises a support base (3) on which a frame (11) is disposed, said frame defining at least one cavity (1a) for the circulation of a coolant. According to the invention, a membrane (4) is disposed on top of the frame (11), said base (3), frame (11) and membrane (4) being assembled at the periphery thereof.

La cathode pour pulvérisation sous vide dont le support de cible (2) est constitué par un refroidisseur, est remarquable en ce qu'elle comprend une embase support (3) sur laquelle est superposé un cadre (11) délimitant au moins un espace vide (1a) pour la circulation d'un fluide de refroidissement, ledit cadre (11) recevant en superposition une membrane (4), l'embase (3), le cadre (11) et la membrane (4) étant assemblés ensemble en périphérie.

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