Vacuum system for a charged particle beam recording system

Details Vacuum system for a charged particle beam recording system Vacuum system for a charged particle beam recording system

H - Electricity

01

J

314/43.4

H01J 37/16 (2006.01) G01D 15/14 (2006.01) G11B 9/10 (2006.01) H01J 37/18 (2006.01)

Patent

CA 1253196

PATENT APPLICATION OF: ANDREW A. TARNOWSKI FOR: IMPROVED VACUUM SYSTEM FOR A CHARGED PARTICLE BEAM RECORDING SYSTEM ABSTRACT An improved vacuum system for a system for accurately tracing on an electron sensitive film with an electron beam which passes through three (3) adjacent vacuum stages and where each stage has a predetermined vacuum level is disclosed herein. The vacuum system is a high performance, fully automatic, three (3) stage, differentially pumped system. Two (2) stages of the system each use a diffusion pump as a first pump means. The diffusion pump of the second stage is backed by a single direct drive mechanical pump and also acts as the backing pump for the diffusion pump of the first stage. The third stage uses a single direct drive mechanical pump for vacuum pumping its chamber. -1-

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