G - Physics – 01 – N
Patent
G - Physics
01
N
73/51.5
G01N 21/64 (2006.01) G01N 21/73 (2006.01)
Patent
CA 1128770
ABSTRACT A Vacuum Ultraviolet plasma atomic emission apparatus and method comprising a plasma purge chamber containing the plasma generated by a plasma generator, a chromator in optical and gaseous communication with said plasma, purge gas supply means for purging said chromator and plasma purge chamber through a tubular connecting means vent means to continuously exhaust gases from said plasma purge chamber, and focusing means between the plasma generator and chromator for focusing light from an excited sample introduced into or near the plasma onto said chromator. The continuous gas purging feature establishes a steady state gaseous environment of minimum absorption characteristics to the specific wavelengths of interest, thus expanding the energy band that may be reliably detected (i.e., particularly the difficult 160-200 nanometer band), and which result is accomplished with excellent reproducibility of data and sensitivity. 27,625-F
346052
Ellebracht Stephen R.
Fairless Charles M.
Smart & Biggar
The Dow Chemical Company
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