B - Operations – Transporting – 32 – B
Patent
B - Operations, Transporting
32
B
B32B 9/00 (2006.01) B32B 18/00 (2006.01) B32B 27/16 (2006.01) C04B 35/03 (2006.01) C04B 35/057 (2006.01) C04B 35/10 (2006.01) C04B 35/14 (2006.01) C23C 14/00 (2006.01) C23C 14/02 (2006.01) C23C 14/08 (2006.01)
Patent
CA 2453596
A vapor-deposited film having a substrate consisting essentially of a polymer material and a vapor-deposited layer consisting essentially of a ceramic, the substrate being subjected to plasma pre-treatment using a hollow anode plasma treatment device, prior to vapor deposition of the vapor-deposited layer.
L'invention concerne un film de dépôt comprenant une matière de base, formée essentiellement d'une matière à poids moléculaire élevé, ainsi qu'une couche de dépôt, formée essentiellement de céramique. Selon l'invention, avant l'opération de dépôt de la couche de dépôt sur la matière de base, cette dernière est prétraitée au plasma au moyen d'un processeur au plasma à anode creuse.
Ishii Ryoji
Kanetaka Takeshi
Nakajima Takayuki
Oohashi Miki
Sasaki Noboru
Fetherstonhaugh & Co.
Toppan Printing Co. Ltd.
LandOfFree
Vapor-deposited film does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vapor-deposited film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapor-deposited film will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-2031608