Vapor deposition apparatus

Details Vapor deposition apparatus Vapor deposition apparatus

C - Chemistry, Metallurgy

23

C

32/23, 148/2.1

C23C 16/00 (2006.01) C23C 16/54 (2006.01)

Patent

CA 1280055

VAPOR DEPOSITION APPARATUS ABSTRACT OF THE DISCLOSURE An apparatus for the treatment of a substrate with two or more gases includes a reaction chamber with an outlet and an inlet, and a gas introduction manifold comprising a closed hollow body with a cylindrical interior. Feed ports, extending through a wall of the body, are integral with valves disposed about said body. An aperture extends through an end surface of the body which aperture is connected to the inlet of the chamber. The valves are disposed such that they are at equal distances from the center axis of the inlet.

520110

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