C - Chemistry – Metallurgy – 08 – J
Patent
C - Chemistry, Metallurgy
08
J
C08J 7/04 (2006.01) B32B 27/28 (2006.01) B65D 30/02 (2006.01) B65D 65/38 (2006.01) C08J 5/18 (2006.01)
Patent
CA 2341296
A vapor deposition film comprises a substrate made of a plastic material, a primer layer made from a composition comprising a specific trifunctional organosilane or a hydrolysate of the organosilane, an acryl polyol and an isocyanate compound, and an inorganic oxide vapor deposition layer to a thickness of 5-300nm, formed by successive lamination on at least one side of the substrate. Also, packaging materials and packages which employ the film are provided.
La présente invention concerne un film obtenu par évaporation sous vide. Ce film comprend un substrat fait d'une matière plastique et, par déposition successive sur au moins une face, une couche primaire à base d'une composition renfermant un organosilane trifonctionnel spécifique ou un hydrolysat dudit organosilane, un polyol acrylique et un composé isocyanate, et une couche d'un oxyde inorganique obtenue par évaporation sous vide d'une épaisseur comprise entre 5 et 300 nm. L'invention concerne un matériau de conditionnement renfermant ledit film et un objet conditionné.
Koizumi Fumitake
Komori Tsunenori
Sasaki Noboru
Sekiguchi Mamoru
Shimatani Ken
Fetherstonhaugh & Co.
Toppan Printing Co. Ltd.
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