Vapor phase deposition of hydrogen silsequioxane resin

Details Vapor phase deposition of hydrogen silsequioxane resin Vapor phase deposition of hydrogen silsequioxane resin

C - Chemistry, Metallurgy

08

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C08L 83/04 (2006.01) B05D 7/24 (2006.01) C08G 77/12 (2006.01) C09D 4/00 (2006.01) C09D 183/04 (2006.01) C23C 16/24 (2006.01) C23C 16/30 (2006.01) C23C 16/40 (2006.01)

Patent

CA 2068353

VAPOR PHASE DEPOSITION OF HYDROGEN SILSESQUIOXANE RESIN ABSTRACT The present invention relates to the deposition of coatings containing silicon and oxygen from vaporized hydrogen silsesquioxane resin. The process comprises introducing the hydrogen silsesquioxane vapor into a deposition chamber containing the substrate to be coated and then inducing reaction of the vapor to form the coating.

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