Vapor phase growth method and growth apparatus

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 16/44 (2006.01) C23C 16/448 (2006.01) C23C 16/452 (2006.01) C23C 16/52 (2006.01)

Patent

CA 2202697

A heating mechanism for heating a substrate is disposed in a growth chamber, a bulb capable of controlling the quantity of gas flowing into the growth chamber is provided between a plurality of organic metal gas sources and the growth chamber. A plasma chamber for inert gas having a transparent portion is provided, the plasm chamber receiving a part of an organic metal raw material gas supplied to the growth chamber through an orifice, The plasma chamber is provided with an exhaustion system performing a differential air exhausting for the plasma chamber and the growth chamber. Provided is an optical system for measuring an light emission intensity by separating emitted light characteristic of a metal in the organic metal raw material gas, the light is emitted from the metal by exciting the organic metal raw material gas partially supplied to the plasma chamber from the growth chamber through the orifice.

Un mécanisme de chauffage pour chauffer un substrat est placé dans une chambre de croissance, un bulbe capable de contrôler la quantité de gaz entrant dans la chambre de croissance est placé entre une pluralité de sources d'organométallique gazeux et la chambre de croissance. L'installation comprend une chambre de plasma pour gaz inertes ayant une partie transparente, ladite chambre de plasma recevant une partie d'un organométallique gazeux amené à la chambre de croissance par un orifice. La chambre de plasma est dotée d'un système d'exhaustion assurant une évacuation différentielle de l'air pour la chambre de plasma et la chambre de croissance. Un système optique mesure l'intensité d'une émission de lumière en séparant la lumière émise caractéristique d'un métal présent dans l'organométallique gazeux, la lumière étant émise par le métal lorsqu'on excite l'organométallique gazeux fourni en partie à la chambre de plasma depuis la chambre de croissance à travers l'orifice.

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