Vapor sampling device

Details Vapor sampling device Vapor sampling device

G - Physics

01

N

150/20, 73/69

G01N 27/12 (2006.01) G01N 7/10 (2006.01) G01N 33/00 (2006.01)

Patent

CA 1044584

ABSTRACT OF THE DISCLOSURE A device for measuring the presence or time- average amounts of at least one selected gas in a mixture thereof which comprises an enclosure having therewithin at least one sustance which interacts with the gas to be monitored. Attenuating means associated with the enclo- sure regulate gas movement within said enclosure to insure that an essentially placid layer of gas exists between the attenuating means and the reactive substance insuring that the amount of selected gas available to react with the interactive substance is basically a function of the con- centration of the gas or gases being measured and its dif- fusion through the placid layer. The amount of selected gas measured is substantially independent of the velocity and impinging angle of the gas mixture at the interface of the enclosure with the ambient gas mixture. The de- vice is capable of controlline mass uptake and response time without losing velocity and angle independence. The control of mass uptake can be accomplished independent of the concentration of detectable gas.

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