Vapour deposition

Details Vapour deposition Vapour deposition

C - Chemistry, Metallurgy

23

C

C23C 14/24 (2006.01)

Patent

CA 2416093

The invention relates to a process for applying a coating to a substrate wherein the coating is formed of at least two components or elements. In a preferred embodiment, the coating is formed of at least two metals. In accordance with the invention, the coating is applied by vapour deposition under choking conditions.

L'invention concerne un procédé d'application d'un revêtement sur un substrat, le revêtement étant composé d'au moins deux composants ou éléments. Dans un mode de réalisation préféré, le revêtement est composé d'au moins deux métaux. Selon la présente invention, le revêtement est appliqué par dépôt par évaporation sous vide dans des conditions de condensation.

Affiliated with

Also associated with

Rating

Vapour deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vapour deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapour deposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1932749