Vapour deposition apparatus and method

Details Vapour deposition apparatus and method Vapour deposition apparatus and method

C - Chemistry, Metallurgy

23

C

C23C 14/24 (2006.01)

Patent

CA 2094132

Apparatus for the physical vapour deposition of an alloy whose constituent elements have widely differing vapour pres- sures comprises an inner evaporation crucible (1) surrounded by a second evaporation crucible (2) having an array of nozzles (9) angled towards collector (5). In use of the apparatus, a charge (3) of relatively low volatility is evaporated from inner crucible (1) using an electron beam (7) focussed by magnet (8). Charge (4) in second crucible (2) is of much higher volatility and is evaporated by radiant heating. The nozzles (9) direct the vapour from charge (4) along pathways which intersect the vapour rising from charge (3) such that the combined vapour stream reaching collector (5) is an intimate mixture of constituents. The nozzles (9) may also serve to control the flow rate of vapour from the second crucible (2).

Affiliated with

Also associated with

Rating

Vapour deposition apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vapour deposition apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vapour deposition apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1554183