Vapour deposition regulating apparatus

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

32/23, 32/3

C23C 14/04 (2006.01) C23C 14/24 (2006.01) C23C 14/54 (2006.01)

Patent

CA 1197088

TITLE A VAPOUR DEPOSITION REGULATING APPARATUS INVENTORS Jerzy A. Dobrowolski ABSTRACT OF THE DISCLOSURE A vapour deposition apparatus for continuously regulating the deposition thickness from vapour as it is being vacuum deposited across and progressively along one side of a substrate from one or more vapour sources spaced thereacross. The apparatus comprises a central shaft rotatably supporting hollow shafts in end-to-end relation, a series of profile discs on each of the hollow shafts and slidable radially thereon by a slot in each profile disc slidably locating on flats on the hollow shafts. The profile discs are placed between vapour sources, and the substrate moving through a vacuum coating chamber so that the profile discs form a mask controlling the vapour deposition across the substrate. The hollow shafts are coupled to electric motors which may rotate the hollow shafts in response to signals from deposition thickness sensing means.

439085

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