Variable-spot raster scanning in an electron beam exposure...

H - Electricity – 01 – L

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H01L 21/423 (2006.01) H01J 37/30 (2006.01) H01J 37/302 (2006.01)

Patent

CA 1149086

Collier-Thomson 14-1 VARIABLE-SPOT RASTER SCANNING IN AN ELECTRON BEAM EXPOSURE SYSTEM Abstract of the Disclosure For a given resolution or address dimension, the pattern-writing speed of an electron beam exposure system is increased by utilizing a new mode of raster scanning. In the new mode, the writing spot dimensions of the electron beam are varied rapidly during the scan. In an electron column designed for variable-spot raster scanning, an illuminated aperture is demagnified to form the writing spot. By imaging a first aperture upon a second aperture and rapidly deflecting the image of the first aperture, the portion of the second aperture that is illuminated by the electron beam is altered. In that way, the spot size is selectively varied in a high-speed way during the raster scanning process. - 1 -

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