Vertical apparatus for continuous deposition of...

Details Vertical apparatus for continuous deposition of... Vertical apparatus for continuous deposition of...

H - Electricity

01

L

356/187

H01L 21/363 (2006.01) C23C 16/54 (2006.01)

Patent

CA 1242816

ABSTRACT Apparatus for continuous deposition of semiconductor alloys by glow discharge including a plurality of interconnected deposition chambers. At least one deposition chamber contains a generally vertical cathode plate having opposed faces for establishing a plasma with a continuous substrate continuously passing through the chamber to deposit semiconductor alloy material on to the substrate. The apparatus includes rollers about which the substrate is trained to advance the substrate between chambers in a generally horizontal path and through the chambers in a generally vertical path, opposed to the cathode plate, to shorten the apparatus.

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