C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 69/743 (2006.01) A61K 6/00 (2006.01) A61K 6/02 (2006.01) A61K 6/083 (2006.01) C07C 233/60 (2006.01) C07C 327/28 (2006.01) C08F 22/10 (2006.01)
Patent
CA 2262166
The invention relates to vinylcyclopropane derivatives according to the formula (see fig I) in which A is -[-Y-CO-C(=CH2)R4] m or -C(=CH2)CO-O-C1-4-alkyl , U and X, independently of each other, stand for CO, COO or CONH; Y and Z stand for O or NH or are absent, but Y and Z cannot be absent at the same time; n, m stand for a whole number from 0 to 4, but n and m are not 0 at the same time; R1 is H, CH3 or Cl; R2, R3 stand for H, a C1- to C10-alkyl or alkylene radical, which can be interrupted by O, S or NH, for a C6- to C14-aryl or arylene, C7- to C14-alkyl aryl or alkylarylene or a C5- to C8-cycloalkyl or cycloalkylene radical; and R4 is H or a C1- to C10-alkyl radical, and to processes for their production. The compounds are suitable in particular for the production of adhesives, cements, composites and mouldings.
Fischer Urs Karl
Moszner Norbert
Rheinberger Volker
Voelkel Thomas
Ivoclar Ag
Ridout & Maybee Llp
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