Volatile nickel aminoalkoxide complex and deposition of...

C - Chemistry – Metallurgy – 07 – F

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C07F 15/04 (2006.01)

Patent

CA 2603749

A volatile nickel aminoalkoxide complex of formula (I) can form a nickel thin film having an improved quality by metal organic chemical vapor deposition (MOCVD).

La présente invention concerne un complexe d'aminoalcoxide de nickel volatil de formule (I) qui peut former un mince film de nickel ayant une qualité améliorée, par dépôt chimico-organique de métal en phase vapeur (metal organic chemical vapor deposition / MOCVD).

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Volatile nickel aminoalkoxide complex and deposition of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Volatile nickel aminoalkoxide complex and deposition of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Volatile nickel aminoalkoxide complex and deposition of... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1764122

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.