C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 15/04 (2006.01)
Patent
CA 2603749
A volatile nickel aminoalkoxide complex of formula (I) can form a nickel thin film having an improved quality by metal organic chemical vapor deposition (MOCVD).
La présente invention concerne un complexe d'aminoalcoxide de nickel volatil de formule (I) qui peut former un mince film de nickel ayant une qualité améliorée, par dépôt chimico-organique de métal en phase vapeur (metal organic chemical vapor deposition / MOCVD).
An Ki-Seok
Chung Taek-Mo
Kim Chang-Gyoun
Kim Yunsoo
Lee Sun-Sook
Cassan Maclean
Korea Research Institute Of Chemical Technology
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