Wafer holding apparatus for holding a wafer

H - Electricity – 01 – L

Patent

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Details

H01L 21/68 (2006.01) B25B 11/00 (2006.01) H01L 21/683 (2006.01)

Patent

CA 2109240

A wafer holding apparatus for holding a wafer stationary includes a main body and a plate member detachably placed on the main body. The main body includes a cavity having an open end at the upper surface of the main body and includes a passageway extending from the cavity to communicate the cavity with a vacuum pump. The plate member is placed on the main body to plug the open end of the cavity and supports on its upper surface a wafer to be processed. The plate member has a number of through bores arranged in a predetermined arrangement matched for the arrangement of micromachined sections of the wafer where micromachines or integrated circuits are to be formed. Before processing of the wafer, the plate member is selected for the wafer in such a manner that the through bores of the plate member are deviated from the micromachined sections of the wafer where the micromachines are to be formed. This results in the micromachined sections being protected from the suction force caused by the vacuum pump, thereby making it possible to enhance the productivity of the wafer.

Un appareil de retenue de tranches conçu pour maintenir stationnaire une tranche comprend un bâti principal et une plaque mobile fixée au bâti principal. Le bâti principal comprend une cavité qui se termine par une ouverture débouchant dans la surface supérieure du bâti principal. Ledit bâti principal comprend une voie qui met en communication la cavité avec une pompe à vide. La plaque placée sur le bâti principal bouche l'ouverture de la cavité et soutient, sur sa surface, une tranche à traiter. La plaque comporte un certain nombre d'alésages disposés selon un schéma prédéterminé en fonction de la mise en place de sections micro-usinées de la tranche, là où des micromachines ou des circuits intégrés doivent être formés. Avant de traiter la tranche, la plaque est choisie en fonction de la tranche, de façon que les alésages contournent les section micro-usinées de la tranche, là où les micromachines doivent être formées. On obtient ainsi des sections micro-usinées qui sont protégées contre la force d'aspiration créée par la pompe à vide, ce qui permet d'améliorer la productivité.

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