H - Electricity – 01 – L
Patent
H - Electricity
01
L
H01L 21/00 (2006.01) H01L 21/677 (2006.01) H01L 21/68 (2006.01) H01L 21/70 (2006.01)
Patent
CA 2150473
A carousel type wafer processing ma- chine in which wafers are held in vertical ori- entations in holders on a rotatable plate and se- quenced through a plurality of processing sta- tions for processing such as by the applica- tion of a sputtered film thereto, is provided with a vacuum front end module that transfers wafers between cassette modules in which the wafers are horizontally disposed and a load- ing and unloading station of the processing ma- chine, through a transfer chamber. The trans- fer chamber includes a wafer transfer arm, an aligning station, a preheating and degassing sta- tion, a cooling station preferably combined with the preheating station, and an uprighting station from which wafers are exchanged with the pro cessing machine. The arm moves unprocessed wafers individually from a cassette module to the aligner, then to the preheating station, then to the uprighting station. The arm also moves processed wafers from the uprighting station, to the cooling station and to a cassette mod- ule. Preferably one cassette module is being vented, reloaded or replaced, and pumped to a vacuum while the wafers of the other are being cycled through the processing machine.
Flegal Christopher M.
Macrae & Co.
Tokyo Electron Limited
LandOfFree
Wafer processing machine vacuum front end method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Wafer processing machine vacuum front end method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wafer processing machine vacuum front end method and apparatus will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1462046