Wafer scrubbing device

B - Operations – Transporting – 08 – B

Patent

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Details

B08B 3/02 (2006.01) B08B 1/04 (2006.01) G11B 23/50 (2006.01) H01L 21/00 (2006.01)

Patent

CA 2223488

A wafer scrubbing device (10) for cleaning the surfaces of a thin disk (W) disposed on a stationary spin chuck (14) employs a double brush arrangement (16) whereby brush (18) rotation induces rotation of the disk (W) to be cleaned and whereby the speed differential between the constant rotational speed of the brushes (18) and the variable rotational speed of the disk (W) due to the relative position of the brushes (18) on the disk (W) causes the scrubbing of both surfaces and the edge of the disk (W).

Dispositif de brossage pour plaquette (10) pour nettoyer les surfaces d'un disque fin (W) placé sur un mandrin rotatif fixe (14), avec un système à double brosse (16). La rotation de la brosse (18) provoque la rotation du disque (W) qui doit être nettoyé et le différentiel entre la vitesse de rotation constante des brosses (18) et la vitesse de rotation variable du disque (W) résultant de la position relative des brosses (18) sur le disque (W) entraîne le brossage des deux surfaces et du bord du disque (W).

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