C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
134/33
C11D 7/26 (2006.01) C11D 7/50 (2006.01) H01L 21/306 (2006.01) C11D 7/24 (2006.01) C11D 7/28 (2006.01)
Patent
CA 2008882
- 20 - WASHING AGENT, WASHING METHOD AND PROCESS FOR PREPARING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE BY USE THEREOF ABSTRACT OF THE DISCLOSURE A washing agent suitable for use on, for example, substrates usable in the production of semiconductors, containing (a) pentafluoropropanol, (b) a solvent mixture of pentafluoropropanol, and at least one solvent miscible with pentafluoropropanol, or a nonflammable fluoroalkyl alcohol containing hexafluoroisopropanol as a main component.
Itoh Katsuhiko
Miyake Hirohiko
Saito Yoshio
Takehana Yohichi
Tsumoto Takamasa
Hitachi Ltd.
Kirby Eades Gale Baker
Mitsui Petrochemical Industries Ltd.
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