Washing agent, washing method and process for preparing...

C - Chemistry – Metallurgy – 11 – D

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C11D 7/26 (2006.01) C11D 7/50 (2006.01) H01L 21/306 (2006.01) C11D 7/24 (2006.01) C11D 7/28 (2006.01)

Patent

CA 2008882

- 20 - WASHING AGENT, WASHING METHOD AND PROCESS FOR PREPARING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE BY USE THEREOF ABSTRACT OF THE DISCLOSURE A washing agent suitable for use on, for example, substrates usable in the production of semiconductors, containing (a) pentafluoropropanol, (b) a solvent mixture of pentafluoropropanol, and at least one solvent miscible with pentafluoropropanol, or a nonflammable fluoroalkyl alcohol containing hexafluoroisopropanol as a main component.

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