G - Physics – 03 – F
Patent
G - Physics
03
F
96/150
G03F 7/028 (2006.01) G03F 7/033 (2006.01)
Patent
CA 1330736
Abstract: The present invention is directed to a water- developable photosensitive resin plate suitable for the manufacture of a relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, which comprises: (A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer (ii) an .alpha., .beta.-ethylenically unsaturated carboxylic acid and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the .alpha., .beta.-ethylenically unsaturated carboxylic acid (ii), the poly- functional vinyl monomer (iii) and the mono- functional vinyl monomer (iv) being respectively from about 5 to 95 mol %, from about 1 to 30 mol %, from about 0.1 to 10 mol % and 0 to 70 mol % based on the combination of those monomeric components; (B) a basic nitrogen atom-containing compound; (C) an ethylenically unsaturated monomer; and (D) a photopolymerization initiator.
547381
Ishikawa Katsukiyo
Konishi Katsuji
Kusuda Hidefumi
Kirby Eades Gale Baker
Nippon Paint Co. Ltd.
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