Water developable photosensitive resin composition

G - Physics – 03 – F

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G03F 7/004 (2006.01) G03F 7/027 (2006.01)

Patent

CA 2017572

- 30 - ABSTRACT Disclosed is a water developable photosensitive resin composition suitable for a printing plate, which has excellent dimensional stability and excellent chemical and physical properties. The photosensitive resin composition comprises; (A) an acrylic resin of which glass transition temperature (Tg), as defined by Image [I] [wherein Tg1, Tg2, .... represents a glass transition temperature of a homopolymer prepared from each monomer, Tg0 represents a glass transition temperature of a copolymer and W1, W2, .... shows a weight fraction of each monomer.] and acid value (AV) satisfy the following relations; 60 °C ? Tg ? 125 °C 80 mg KOH/g ? AV ? 130 mg KOH/g, and Tg - 10 ? AV ? Tg + 40 (B) a basic nitrogen atom-containing compound (C) an ethylenically unsaturated monomer, and (D) a photopolymerization initiator.

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