G - Physics – 03 – F
Patent
G - Physics
03
F
96/175
G03F 7/033 (2006.01)
Patent
CA 1328048
- 1 - Abstract: Disclosed is a water-developable photosensitive resin composition capable of hot melt molding, which comprises: (i) a water soluble or water dispersible polyvinyl alcohol prepared by saponifying a copolymer which is obtained by copolymerizing 0 to 20 mol % of a monomer not having an ionic group (hereinafter referred to as "nonionic monomer"), 0 to 10 mol % of an ionic group-containing monomer (hereinafter referred to as "ionic monomer") and the remaining amount of a vinyl ester in the presence of a thiolic acid wherein the total content of the ionic monomer and nonionic monomer is 0.1 to 20 mol %; said polyvinyl. alcohol having a terminal mercapto group, a saponification degree of the vinyl ester unit of 50 to 70 mol %, and a hot melt flow starting temperature of 60 to 130°C, (ii) a polymerizable monomer and (iii) a photopolymerization initiator. This resin composition is suitable for use in the preparation of resins or printing plates.
556496
Kawaguchi Chitoshi
Kawanami Toshitaka
Kimoto Koichi
Umeda Yasushi
Kirby Eades Gale Baker
Nippon Paint Co. Ltd.
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