C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 417/06 (2006.01) A61K 31/496 (2006.01) A61K 31/661 (2006.01) A61P 31/10 (2006.01) C07D 249/08 (2006.01) C07D 403/06 (2006.01) C07D 405/14 (2006.01) C07D 407/14 (2006.01) C07F 9/06 (2006.01) C07F 9/6518 (2006.01) C07F 9/6558 (2006.01)
Patent
CA 2397734
Water-soluble prodrugs of triazole antifungal compounds having a secondary or tertiary hydroxy group are provided. More particularly, new water-soluble triazole antifungal compounds are provided having the general formula (I) wherein A is the non-hydroxy portion of a triazole antifungal compound of the type containing a secondary or tertiary hydroxyl group and R and R1 are as defined in the specification.
L'invention concerne des promédicaments de composés antifongiques de triazole, solubles dans l'eau, présentant un groupe hydroxy secondaire ou tertiaire. Plus particulièrement, l'invention traite de nouveaux composés antifongiques de triazole, solubles dans l'eau, présentant la formule (I). Dans cette dernière, A est la partie non hydroxy d'un composé antifongique de triazole du type contenant un groupe hydroxyl secondaire ou tertiaire et R et R?1¿ sont tels que définis dans le descriptif.
Chen Chung-Pin
Golik Jerzy
Hudyma Thomas W.
Matiskella John D.
Ueda Yasutsugu
Bristol-Myers Squibb Company
Eisai R. & D. Management Co. Ltd.
Gowling Lafleur Henderson Llp
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