Wet process for removing specific component from gas

Details Wet process for removing specific component from gas Wet process for removing specific component from gas

B - Operations, Transporting

01

D

23/341, 165/38

B01D 53/12 (2006.01)

Patent

CA 1115030

ABSTRACT OF THE DISCLOSURE Disclosed is a wet process for efficiently and economically removing a specific gas component and/or solid component from a gas containing the same wherein the gas is countercurrently contacted with a scrubbing liquid in a perforated or grid plate column without weir and downcomer and having a free-space ration of 0.03 to 0.60. The gas is passed through the column at a superficial gas velocity within the range of: (1) in the case of a liquid flow rate of from 10,000 to 110,000 kg/m2 hr: (a) from more than UgMIN to less than 3 m/sec. or (b) from more than 5.8 m/sec to 8 m/sec; and in the case of a liquid flow rate of from more than 110,000 to 250,000 kg/m2 hr, from more than UgMIN to 8 m/sec. The scrubbing liquid is passed through the column at a liquid flow rate of from 10,000 to 250,000 kg/m2 hr, and the liquid to gas flow ratio is not less than 0.5.

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