Wet processing using a fluid meniscus, apparatus and method

B - Operations – Transporting – 08 – B

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B08B 3/10 (2006.01) B81C 99/00 (2010.01) H01L 21/02 (2006.01)

Patent

CA 2663325

A wet processing apparatus and method that takes advantage of a fluid meniscus to process at least a portion of a surface of an object. After one surface of the object has been processed another side or surface of the object can be similarly processed. This processing can be coating, etching, plating, to name a few. An application of the apparatus and method is in the semiconductor processing industry, especially, the processing of wafers and substrates. The method and apparatus also allows the processing of multiple surfaces of an electronic component.

La présente invention concerne un appareil et un procédé de traitement en milieu humide qui utilisent à leur avantage un ménisque de fluides pour traiter au moins une partie d'une surface d'un objet. Une fois qu'une surface de l'objet a été traitée, un autre côté ou une autre surface de l'objet peut être traité de manière similaire. Ce traitement peut être notamment l'enrobage, le gravage et le placage. Une application de l'appareil et du procédé se situe dans l'industrie du traitement des semi-conducteurs, plus particulièrement le traitement de puces et de substrats. Le procédé et appareil permettent également le traitement de multiples surfaces d'un composant électronique.

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