Workpiece holder for semiconductor manufacturing apparatus

Details Workpiece holder for semiconductor manufacturing apparatus Workpiece holder for semiconductor manufacturing apparatus

H - Electricity

01

L

H01L 21/68 (2006.01) H01L 21/687 (2006.01)

Patent

CA 2424391

Semiconductor-manufacturing-apparatus workpiece holder whose wafer-retaining surface is superior in isothermal properties, and that is suitable for use in thermosetting of photolithographic photoresists in coater/developers, and in baking of low dielectric constant, i.e. low-.k, insulating films. The workpiece holder is made up of a wafer holder 1, and a support member 4 that supports the wafer holder 1, and features the thermal conductivity of the support member 4 being lower than the thermal conductivity of the wafer holder 1. The wafer holder 1 and the support member 4 either are not joined, or if joined are made to have a difference in thermal expansion coefficient of 2.0 x 10-8°C or less. The chief component of the wafer holder 1 preferably is AIN, and of the support member 4, mullite.

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