Woven loop seam fabric with improved loop alignment

Details Woven loop seam fabric with improved loop alignment Woven loop seam fabric with improved loop alignment

D - Textiles, Paper

21

F

D21F 7/08 (2006.01) D03D 15/00 (2006.01) D21F 1/00 (2006.01)

Patent

CA 2228297

The present invention provides an open ended papermaker's fabric having first and second layers of machine direction (MD) yarns interwoven with a plurality of cross machine direction (CMD) yarns. Additional CMD yarns are interwoven with both MD layers at each end of the fabric between the last CMD yarn and the seam loops in a balancing weave that establishes vertical and horizontal alignment for the seam loops.

Cette invention permet d'obtenir un tissu de machine à papier à extrémité ouverte dans lequel les première et deuxième couches des fils sens machine sont entrelacés à un certain nombre de fils en sens travers. D'autres fils en sens travers sont entrelacés à la fois à des couches en sens machine se trouvant à chaque extrémité du tissu entre les derniers fils en sens travers et aux boucles de couture. Cela forme une armure d'équilibrage dans laquelle les boucles de couture sont alignées verticalement et horizontalement.

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