D - Textiles – Paper – 21 – F
Patent
D - Textiles, Paper
21
F
139/58
D21F 1/00 (2006.01) D21F 11/00 (2006.01)
Patent
CA 1269025
ABSTRACT OF THE DISCLOSURE A papermaking fabric and method therefor is dis- closed which may be used as a support fabric or a carrier fabric for paper material on a papermaking machine. The fabric, designated generally as (A) includes a first layer (B) of warp yarns extending in a machine direction. A second layer of warp yarns is included in the fabric ver- tically spaced from the first layer. The warp yarn of the first and second layer form stacked pairs which reinforce the fabric in a machine direction to enhance its stability. At the same time, the stacked pairs may be spaced apart in a crossmachine direction sufficiently to provide a desired degree of openness and fabric permeability. Fabric openness in the range of thirty percent or more of the total fabric area can be had in accordance with the fabric of the present invention without sacrificing the structural stability. A single weft system is interwoven with the first and second warp layers (B and C) in a balanced weave pattern that maintains the warp yarns of the respective layers stacked. The balanced weave pattern of the weft resists lateral shifting of the stacked warp yarns to prevent them from becoming side-by-side. In a preferred embodiment, the fabric is utilized as a base fabric for a resinous layer which supports the paper and has an embossed surface which makes a corresponding pattern in the paper, such as in towel grade paper.
515026
Fetherstonhaugh & Co.
Hermann Wangner Gmbh & Co. Kg
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