Writing of photo-induced structures

G - Physics – 02 – B

Patent

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G02B 6/124 (2006.01) G02B 5/18 (2006.01) G11B 7/0065 (2006.01)

Patent

CA 2530777

A method of writing a photo-induced structure into a photosensitive material substrate, the method comprising the steps of creating an interference pattern utilising at least two light beams, exposing the substrate to the interference pattern for photo-inducing material changes in the substrate, and creating an irregularity in the interference pattern by controlling a wavefront of at least one of the beams, for creating a functional defect in the photo-induced structure.

Procédé d'écriture d'une structure photo-induite dans un substrat en matériau photosensible. Ce procédé consiste à créer une configuration d'interférence au moyen d'au moins deux faisceaux lumineux, à exposer le substrat à cette configuration d'interférence afin de photo-induire des modifications matérielles dans le substrat et à créer une irrégularité dans la configuration d'interférence par contrôle d'un front d'ondes d'au moins un des faisceaux, de manière à créer un défaut fonctionnel dans la structure photo-induite.

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