C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/515.6, 260/4
C07D 209/48 (2006.01) A61K 49/04 (2006.01)
Patent
CA 1071228
ABSTRACT OF THE DISCLOSURE This invention relates to compounds of the formula; Image I in which: R1 represents a hydrogen atom or a radical of the formula Image in which R4 and R5 represents, independently of each other, a hydrogen atom or a lower alkyl radical, R2 represents a hydrogen atom or a lower alkanoyl radical, R3 represents a hydrogen atom, a lower alkyl radical or a lower alkanoyl radical, n is 3 or 4, and their lower alkyl esters and their salts with pharmaceutically acceptable bases. Said compounds are useful as X-ray contrast media.
228142
Hardouin Michel J.c.
Lautrou Jean
Tilly Guy
Laboratoires Andre Guerbet
Na
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