C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/473.5, 260/5
C07C 233/12 (2006.01)
Patent
CA 1105481
ABSTRACT OF THE DISCLOSURE This invention relates to compounds of the formula: Image (I) in which: R1 represents a hydrogen atom or a C1-4alkyl radical or a C1-4 hydroxyalkyl radical, R2 represents a C1-4 alkyl radical or a C1-4 hydroxyalkyl radical, A represents a group of the formula: Image in which : R3 represents a hydrogen atom, a group of the formula Image in which R5 and R6 represent each a hydrogen atom or a C1-4 alkyl radical or a C1-4 hydroxyalkyl radical, or a group of the formula Image in which R7 represents a C1-4 alkyl radical or a C1-4 hydroxyalkyl radical and R8 represents a hydrogen atom, a C1-4 alkyl radical or a C1-4 hydroxyalkyl radical, n is o or 1 and n is an integer from 1 to 5 inclusive, R4 represents a hydrogen atom or a C1-4 alkyl radical or a C 1-4hydroxyalkyl radical, their methyl and ethyl esters and their salts with pharmaceutically acceptable bases. Said compounds are useful as X-ray contrast media.
275511
Hardouin Michel J.
Lautrou Jean
Tilly Guy
Goudreau Gage & Associates
Guerbet S.a.
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