X-ray lithographic system

Details X-ray lithographic system X-ray lithographic system

H - Electricity

01

L

356/192, 358/22

H01L 21/02 (2006.01) G03F 7/20 (2006.01) H01L 21/30 (2006.01)

Patent

CA 1192673

-1- Abstract: The present invention relates to a system of X-ray lithography. In an X-ray lithographic system a unit is provided to cause synchrotron radiation flux of a desired diameter to be incident on a convex mirror. A radiation sensitive resist film is exposed to the reflected flux from the mirror through a mask. A relatively uniform flux intensity over the film is obtained by providing a unit which rotates or rotatingly vibrates the mirror about a rotational axis which is parallel to a center axis of the convex mirror and which is eccentric to the convex mirror.

439140

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