X-ray lithography apparatus

Details X-ray lithography apparatus X-ray lithography apparatus

H - Electricity

05

G

358/11

H05G 1/00 (2006.01) G03F 7/20 (2006.01)

Patent

CA 1131806

ABSTRACT OF THE DISCLOSURE Apparatus for x-ray lithography comprises a source chamber in which are disposed an electron gun and a target capable of generating M-line x-ray radiation when impinged upon by electrons from the gun, the chamber having a window for the radiation, and a supply of electrical potential above 5 kv. for causing the apparatus to efficiently generate the M-line, this line being at a wavelength which will be absorbed by the resist normally used in lithography. In order to obtain shorter exposure time and to obtain a longer life in the x-ray lithography apparatus, an x-ray target made of tungsten is preferably utilized.

383970

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