G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 1/14 (2006.01) H01L 21/027 (2006.01)
Patent
CA 2082909
An X-ray mask structure comprises an X-ray absorber having a desired pattern, an X-ray permeable film supporting the X-ray absorber, and a supporting frame for supporting the X-ray permeable film. The X-ray mask structure has a metal oxide film formed on the portion of the X-ray permeable film having no X-ray absorber thereon.
Canon Kabushiki Kaisha
Ridout & Maybee Llp
LandOfFree
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