G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 1/08 (2006.01) G03F 1/14 (2006.01)
Patent
CA 2079725
An X-ray mask structure has an X-ray absorber, an X-ray permeable film and a frame for supporting the X-ray permeable film, wherein the X-ray absorber is made of gold having crystal orientation such that with respect to the peak strength 1 of the (200) surface, the peak strength of the (111) surface is less than 0.5 in an X-ray diffraction test. A method of manufacturing X-ray mask structures includes the step of forming the X-ray absorber, in which after an X-ray absorbing film is formed on the X-ray permeable film, heating and cooling operations are repeated a plurality of times.
Une structure pour masquer les rayons X qui possède un absorbeur de rayons X, un film perméable aux rayons X et un cadre pour supporter le film perméable aux rayons X, où l'absorbeur de rayons X est constitué d'or dont l'orientation des cristaux est telle que le rapport de l'intensité du pic de la surface (200), à l'intensité du pic de la surface (111) est inférieur à 0,5 dans un test de diffraction des rayons X. Une méthode de fabrication de structures pour masquer les rayons X comprend l'étape de formation de l'absorbeur de rayons X; après formation de l'absorbant des rayons X sur le film perméable aux rayons X, des opérations de chauffage et refroidissement sont répétées plusieurs fois.
Canon Kabushiki Kaisha
Ridout & Maybee Llp
LandOfFree
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