Zirconium mask for semiconductor fabricated using alkaline...

C - Chemistry – Metallurgy – 23 – F

Patent

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149/10, 96/219

C23F 1/04 (2006.01) H01L 21/00 (2006.01) H01L 21/308 (2006.01) H01L 23/29 (2006.01)

Patent

CA 897040

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