C - Chemistry – Metallurgy – 01 – G
Patent
C - Chemistry, Metallurgy
01
G
23/252
C01G 25/04 (2006.01) C04B 35/48 (2006.01) C04B 35/486 (2006.01) C23C 14/08 (2006.01) C23C 14/14 (2006.01)
Patent
CA 1331272
Abstract of the Disclosure: Zirconium oxide sinter for use in forming a thin film thereof by vapour deposition etc., having a purity not less than 99.0 % by weight with unavoidable hafnium oxide and a density more than 4.9 g/cm3. Desirably the sinter further contains calcium oxide in an amount from 50 to 2000 ppm. The sinter can produce a uniform zirconium oxide thin film which can be used in optical applications with superior characteristics.
593834
Katoh Akemi
Minoya Katuo
Oizumi Fukuo
Uema Tutomu
Uemura Kinitiro
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
Tosoh Corporation
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