Tricyclic compounds

Details Tricyclic compounds Tricyclic compounds

C - Chemistry, Metallurgy

07

D

260/355.5, 260/3

C07D 239/00 (2006.01) C07D 313/14 (2006.01) C07D 337/14 (2006.01)

Patent

CA 1043342

ABSTRACT OF THE DISCLOSURE This invention relates to a process for the manufacture of compounds of the formula Image I wherein X represents an oxygen or sulphur atom, R1 represents a hydrogen atom or a lower alkyl group, R6' represents a halogen atom or a lower alkyl, lower alkoxy, lower alkylthio, lower alkylsulphonyl, di(lower alkyl)sulphamoyl, hydroxy, benzyloxy, trimethylsilyloxy, trifluoromethyl, nitro, amino or di(lower alkyl)amino group, R7' and R8' each individually represent a hydro- gen atom or a substituent denoted by R6' and Y represents lower alkylsulfonyl- oxy, lower arylsulfonyloxy, chlorine or bromine, which comprises reacting a compound of the formula Image II wherein X, R1 and R6' - R8' have the above meanings, with a lower alkyl- or lower arylsubstituted sulfonic acid halide or thionyl chloride or bromide The dibenzo[b,f]thiepin and dibenz[b,f]oxepin derivatives of formula I are useful as starting materials for the manufacture of dibenzo[b,f]thiepin and dibonz[b,f]oxopin derivatives which form the subject matter of our copending Canadian Application for Letters Patent No 201,871 filed June 6, 1974.

291667

Affiliated with

Also associated with

Rating

Tricyclic compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Tricyclic compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Tricyclic compounds will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1025957