C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/100, 260/118
C07D 499/00 (2006.01) C07D 501/18 (2006.01)
Patent
CA 1109859
Abstract Compounds of the f ormula Image wherein A is Image , Image , Image , or Image , R is hydrogen, lower alkyl, benzyl, p-methoxybenzyl, p-nitrobenzyl, diphenylmethyl, tri(lower alkyl)silyl, lower alkoxymethyl, 2,2,2-trichloroethyl, -?H-O-?-R5, or Image , Y is halogen or lower alkoxy; R1 is lower alkyl, phenyl, or substituted phenyl; and X is hydrogen, lower alkanoyloxY, -O-?-NH2, Image , Image , or certain heterothio groups; R4 is hydrogen or lower alkyl; R5 is lower alkyl; are disclosed. These compounds, particularly the free acids, possess the useful pharmccological property of inhibiting .beta.-lactamase enzymes as well as bcing usefnl as intermediates, particularly where R is a readily cleavable ester, in the preparation of antibacrerially active 6.alpha.- methoxy penicillins and 7.alpha.-methoxy cephalosporins.
289794
Osler Hoskin & Harcourt Llp
Squibb (e.r.) & Sons Inc.
LandOfFree
Thiooxime cephalosporin and penicillin derivatives does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Thiooxime cephalosporin and penicillin derivatives, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Thiooxime cephalosporin and penicillin derivatives will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1064851