Controlled scrubbing of effluent gases containing waste halides

Details Controlled scrubbing of effluent gases containing waste halides Controlled scrubbing of effluent gases containing waste halides

Category

B - Operations, Transporting

Subcategory

01

Subsubcategory

D

CPC

23/358

IPC codes

B01D 53/34 (2006.01) B01D 53/68 (2006.01)

Type

Patent

Patent number

CA 1076780

Description

ABSTRACT A process for cleansing waste halides from a waste gas stream containing waste halide impurities wherein the waste gas stream is contacted with an aqueous acid mist selected from HCl, HNO3, HBr, HF, and HI, or an aqueous halide salt mist selected from halide salts of calcium, sodium, ammonium, lithium, barium, and iron, with the provisos that the temperature of the combined gas stream and aqueous mist is about -5 to 70°C, the water vapor pressure of the aqueous mist is about 0.05-5.0 mm Hg, and the ratio of surface area of the aqueous mist to the weight of waste halide is at least 2 square meters surface area of aqueous mist per gram of waste halide. Then the gas stream is separated from the acid and the gas stream is scrubbed with water.

Application Number

270073

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