Chemical vapour deposition of titanium borides on graphite mold

Details Chemical vapour deposition of titanium borides on graphite mold Chemical vapour deposition of titanium borides on graphite mold

B - Operations, Transporting

22

C

22/108, 32/23, 1

B22C 9/00 (2006.01) B22C 9/06 (2006.01) B22C 23/02 (2006.01) C23C 16/38 (2006.01)

Patent

CA 1267767

ABSTRACT Apparatus and process provide an oxidation resistant refractory coating of a titanium boride for a graphite mold. The coating is deposited on surfaces of the mold of an essentially uniform thickness in the range of 20 microns up to 80 microns. The coating is deposited by chemical vapour deposition at temperatures in the range of 900 to 950°C. Sources of titanium and boron are mixed to produce titanium diboride which is deposited onto the graphite mold surface within a reactor, maintained at the reaction temperature.

501598

Affiliated with

Also associated with

Rating

Chemical vapour deposition of titanium borides on graphite mold does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Chemical vapour deposition of titanium borides on graphite mold, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Chemical vapour deposition of titanium borides on graphite mold will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1172885