Method of making an anisotropic silicon nitride comprising...

Details Method of making an anisotropic silicon nitride comprising... Method of making an anisotropic silicon nitride comprising...

C - Chemistry, Metallurgy

04

B

25/128

C04B 41/00 (2006.01)

Patent

CA 1247334

-13- ABSTRACT A method is disclosed of densifying a silicon nitride comprising compact having 5-17% by weight yttrium silicon oxynitride and having a density of 2.0-2.6 gm/cm3. The method comprises (a) partially sintering the compact at a temperature of 3000-3200°F for a period of .5-72 hours to form a semidense body with a density of 2.9-3.15 gm/cm3, and (b) hot pressing a stacked assembly of said bodies in the hot zone of a hot pressing cavity to form fully dense anisotropic products, each obdy being separated from the other within the assembly by a distance no greater than .03 inch, and the stacked assembly occupying substantially the entire length of the hot zone of the hot pressing cavity.

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