C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/354, 260/602
C07D 319/20 (2006.01) C07C 93/00 (1985.01)
Patent
CA 1196650
ABREGE DESCRIPTIF Nouveaux produits de formule générale: Image dans laquelle R1 = H, CH3, COCH3 R2 =H, CH3 Image avec .SIGMA. = H, ou un ou plusieurs substituants tels que halogène, OH, OCH3. Leur méthode de synthèse est aussi décrite. Ils possèdent une activité alphabloquante et antiagrégante plaquet- taire.
400482
Courtiol Christian
Creuzet Marie-Helene
Feniou Claude
Pontagnier Henri
Prat Gisele
Asta Medica
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
LandOfFree
4-aminoethoxy-5-isopropyl-2-methyl phenyl derivatives;... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with 4-aminoethoxy-5-isopropyl-2-methyl phenyl derivatives;..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and 4-aminoethoxy-5-isopropyl-2-methyl phenyl derivatives;... will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1178548