C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/243.1
C07D 285/18 (2006.01) C07D 417/12 (2006.01)
Patent
CA 1240322
A B S T R A C T Compounds of the formula (I) :- R1R2N(CH2)n-Z-(CH2)m-Y-(CH2)p Image (I) and salts thereof, wherein R1 and R2 are hydrogen, alkyl, substituted alkyl or are joined; n is 1 to 6; Z is 1,3-phenylene, 1,4-phenylene, 2,4-pyridyl wherein the R1R2N(CH2)n group is in the 4-position; m is zero or one; Y is oxygen, sulphur or methylene; p is two, three or four; and R3 and R4 are independently hydrogen, C1-6alkyl, aryl, aryl(C1-6)alkyl or pyridyl(C1-6)- alkyl, or R3 and R4 together with the carbon atoms to which they are attached form a benzene ring optionally substituted by C1-6alkyl are described as histamine H2-antagonists. Their use in pharmaceutical compositions is described, as are processes for their preparation.
466184
Brown Thomas H.
Durant Graham J.
Gowling Lafleur Henderson Llp
Smith Kline & French Laboratories Limited
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