C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/101.5
C07D 501/59 (2006.01) C07D 277/20 (2006.01) C07D 277/30 (2006.01) C07D 285/10 (2006.01)
Patent
CA 1199320
ABSTRACT OF THE DISCLOSURE Cephem compounds and their pharmaceutically acceptable salts and their process of preparation are provided, the compounds have the formula: Image wherein R1 is amino substituted thiazolyl which may have halogen(s), protected amino substituted thiazolyl which may have halogen(s), lower alkylamino substituted thiazolyl, amino substituted thiadiazolyl, protected amino-substituted thiadiazolyl, amino substituted pyridyl, protected amino substituted pyridyl, furyl, thiazolyl, thiadiazolyl, phenyl, or naphthyl, R2 is carboxy(lower)alkyl or protected carboxy- (lower)alkyl, R3 is lower alkylthio, and R4 is carboxy or protected carboxy; the compounds can be used for treating infectious diseases caused by pathogenic bacteria.
395268
Takasugi Hisashi
Takaya Takao
Yamanaka Hideaki
Fujisawa Pharmaceutical Co. Ltd.
Marcoux & Sher Swabey Mitchell Houle
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