Imidazole derivatives, processes for the manufacture thereof...

Details Imidazole derivatives, processes for the manufacture thereof... Imidazole derivatives, processes for the manufacture thereof...

C - Chemistry, Metallurgy

07

D

260/302, 260/305

C07D 403/04 (2006.01) C07D 207/34 (2006.01) C07D 233/54 (2006.01) C07D 417/04 (2006.01) C07D 487/04 (2006.01) C07D 487/14 (2006.01)

Patent

CA 1195325

The present invention provides a compound of the general formula (I), Image in which Ar1 and Ar2, which may be the same or different, each represents a phenyl radical which is unsubstituted or substituted by one or more of the same or different substituents selected from halogen atoms, alkyl radi- cals and alkoxy radicals; R1 represents a pyrrolyl radical, indolyl radical, imidazolyl radical or thiazolyl radical each of which is unsubstituted or substituted by one or more of the same or different substituents selected from alkyl radicals, free and esterified carboxy groups, free and esterified carboxyalkyl radicals, trimethylene groups, benzyl groups and benzenesulphonyl groups; and R2 represents a hydrogen atom; an alkyl or a halo- alkyl radical; or a dimethylene, trimethylene or tetramethylene group each of which is bonded to the nitrogen atom of R1, and salts thereof. The salts have anti-inflammatory and anti-allergenic properties and are also useful for the treatment of migraine and dysmenorrhoea.

413198

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