Method for the manufacture of bipolar transistor structures...

Details Method for the manufacture of bipolar transistor structures... Method for the manufacture of bipolar transistor structures...

H - Electricity

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356/130, 356/146

H01L 21/00 (2006.01) H01L 21/033 (2006.01) H01L 21/285 (2006.01) H01L 21/331 (2006.01)

Patent

CA 1216076

ABSTRACT OF THE DISCLOSURE A method for the manufacture of bipolar transistor structures with self-adjusted emitter and base regions wherein the emitter and base regions are generated by an out-diffusion from doped polysilicon layers. Dry etching processes which produce vertical etching profiles are employed for structuring the SiO2 and polysilicon layers. The employment of additional oxidation processes for broadening the lateral edge insulation (see arrow 9) during the manufacture of the bipolar transistor structures enables self-adjusted emitter-base structures with high reproducibility in addition to advantages with respect to the electrical parameters. The method is employed for the manufacture of VLSI circuits in bipolar technology.

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