C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
402/297, 400/300
C07D 211/06 (2006.01) C07D 471/10 (2006.01) C08G 61/02 (2006.01) C08G 61/12 (2006.01) C08K 5/34 (2006.01) C08K 5/3435 (2006.01)
Patent
CA 1178586
Abstract Polymers or oligomeric compounds of the general formula Image in which X, Xa and Xb are an ester, amide or cyano group, y.ya and yb are -0- or -NR10-, R1, R1a and R1b are a group which contains a polyalkylpiperidine radical, and R1a can also be alkyl, and R3, R3a and R3b are alkylene, alkenylene, arylene-dialkylene, cycloalkylene-dialkylene or monooxa- alkylene or polyoxa-alkylene, can be prepared by the poly- condensation of malonic acid estersor amides or cyanoacetic acid esters or amides wlth difunctional compounds, prefer- ably dihalogen compounds, in the presence of bases. The products obtained have a molecular weight of 800 to 20,000 and are outstanding light stabilisers for organic polymers.
409309
Ciba Specialty Chemicals Holding Inc.
Fetherstonhaugh & Co.
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