Photosensitive polymer composition and electrophoretic...

Details Photosensitive polymer composition and electrophoretic... Photosensitive polymer composition and electrophoretic...

C - Chemistry, Metallurgy

25

D

96/150, 204/97.0

C25D 13/06 (2006.01) G03F 7/027 (2006.01) G03F 7/16 (2006.01)

Patent

CA 1257803

- 1 - PATENT APPLICATION of WILLIAM DAVID EMMONS and MARK ROBERT WINKLE for PHOTOSENSITIVE POLYMER COMPOSITION AND ELECTROPHORETIC DEPOSITION PROCESS DN 83-62 MSA:plb ABSTRACT OF DISCLOSURE The invention is directed to a photosensitive polymer composition capable of being electro- phoretically depositable as an adherent, uniform photosensitive film on a conductive surface. The photosensitive polymer composition useful for electrodeposition is formed from an aqueous solution or emulsion of at least one polymer having charged carrier groups, a photoinitiator and a source of unsaturation for crosslinking the resulting film upon exposure to actinic radiation. The photosensitive film formed from the photosensitive polymer composition is aqueous developable and resistant to strong inorganic acids and strong bases. The photosensitive polymer composition is useful in the preparation of printed circuit boards, lithographic printing plates, cathode ray tubes, as well as in chemical milling, solder resist and planarizing layer applications.

490519

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